Super-Oscillating Diffractive Optical Spot Generators

How Cee® equipment is used

A Cee® spin coater applies Shipley 1805 resist to aluminum-coated, 100 mm fused-silica wafers. Lithography and aluminum etching form the aperture array, followed by another resist-patterning sequence for the diffractive phase structures. The source does not identify an exact coater model.

Equipment reported

Cee spin coater; model unspecified

Source type

Research paper

Publication year

2024

Materials

S1805

Substrate

Glass

Source

Photonics (MDPI)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include S1805.