Developing Planarization Technique for SiNx

How Cee® equipment is used

The Stanford project report identifies an Apogee® spin coater for HSQ application during development of a silicon-nitride planarization method. The report does not specify a coater size.

Equipment reported

Apogee spin coater

Source type

Research project report

Publication year

Not recorded

Materials

HSQ

Substrate

Not reported

Source

Stanford Nano Shared Facilities

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include HSQ.