Spin Coat: E-Beam resist station [BREWER-Ebeamspinbake] | Quantum-Nano Fabrication and Characterization Facility | University of Waterloo

How Cee® equipment is used

Waterloo's electron-beam-resist station pairs a Cee® 200X with a Cee® 1300X for coating and bake processing. It is a distinct facility workflow from the UV-resist station.

Equipment reported

Cee 200X; Cee 1300X

Source type

Facility process reference

Publication year

Not recorded

Materials

Photoresist

Substrate

Not reported

Source

University of Waterloo QNFCF

Process context

This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include Photoresist.