Captive Spin Chucks

Captive Spin Chucks are typically recommended for developing and cleaning substrates that need a geometry matched to their shape. Captive arms locate the specified substrate and provide lateral support during the process.

  • Typically recommended for developing and cleaning
  • Captive arms matched to the substrate footprint
  • Support geometry establishes substrate position
  • Configured for substrate dimensions, contact needs and chemistry

Made to order

Each captive chuck is custom made for your substrate dimensions and process requirements.

SKU unavailable — custom made to order.

Spin coating a rectangular substrate?

Product Information

Support for Developing and Cleaning

Captive Spin Chucks hold square, rectangular and other specified substrates within a dedicated arrangement of supports. They are typically used for developing and cleaning, where corner coating uniformity is less critical or the process allows an exclusion area. Vacuum or mechanical holding can be used, depending on the supplied configuration.

Located by Captive Arms

The captive arms locate a correctly loaded substrate and provide lateral support, so a separate centering device is not needed for the matched arrangement. The open support geometry typically requires less cleaning than a recessed chuck because there is less chuck material. Both designs are designed to minimize backside contamination, with results dependent on the process.

Recessed vs. Captive Spin Chucks

Comparison
Recessed Chuck
Captive Chuck
Typical processes
Spin coating
Developing and cleaning
Corner uniformity
Emulates a round wafer to improve coating uniformity at corners and edges
Typically used when corner coating uniformity is less critical or the process allows an exclusion area
Substrate retention
Vacuum pad
Vacuum or mechanical holding, depending on configuration
Cleaning
More surrounding chuck material to clean
Typically requires less cleaning because there is less chuck material
Backside contamination
Designed to minimize backside contamination; results depend on the process
Designed to minimize backside contamination; results depend on the process

Describe the Application

Provide the substrate drawing, dimensions, thickness, material and weight when available. Identify the allowed edge and backside contact areas, developing or cleaning chemistry, Cee tool model and intended recipe conditions.

Material and Retention Details

Available construction materials include Delrin®, PVDF, PTFE, stainless steel, PEEK and anodized aluminum. Select the material and holding arrangement together with chemical compatibility and substrate-contact requirements. Specify vacuum or mechanical holding as part of the configuration.

Use the Matched Substrate

The arms and contact areas are made for the specified piece rather than serving as a universal adjustable holder. Keep the matched substrate and chuck together, and use the supplied installation, loading and removal procedures.

Substrates

Specified substrate shapes and sizes

Typical Process

Developing and cleaning

Positioning

Captive arms and lateral support

Utilities & Tool Fit

Retention

Vacuum or mechanical holding; confirm supplied configuration

Tool Interface

Matched to the specified Cee tool

Operating Limits

Defined for substrate and process

Find the right chuck for your substrate.