Cee® 100 Spin Coater – Utah Nanofab Wiki

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Negative Photoresist, Positive Photoresist

Spin Coater, 200mm Spin Coater, 100 (Legacy)

Source:University of Utah Nanofab

Material: Negative Photoresist, Positive Photoresist

Source:Unknown

The University of Utah Nanofab wiki lists a Cee® 100 Spin Coater used for photoresist coating in lithography processes within a shared cleanroom environment.

Publication Year: 2022

Process Overview

This University of Utah Nanofab wiki page documents the Cee® 100 Spin Coater as part of the facility’s lithography tool set. The system is explicitly associated with photoresist coating processes, supporting standard cleanroom workflows for patterning and device fabrication. The page serves primarily as a tool reference rather than a detailed process document, but it clearly ties photoresist application to the Cee® 100 Spin Coater, making it a relevant facility-level reference for Cee® equipment in active academic nanofabrication use.

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Spin Coater, 200mm Spin Coater, 200X (Legacy)

The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.

Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics

4 inch

MIBK

Spin Coater, 200mm Spin Coater, 100 (Legacy)

This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit

Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

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Spin Coater, 200mm Spin Coater, 200X (Legacy), Bake Plates, Apogee® 200 Bake Plate, 1300X (Legacy)

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