Paper / report
Pyrene-based resist coating for electron-beam lithographyCee® 200X
George Mason University documents positive- and negative-resist workstations that combine coating, baking, and development within its photolithography workflow.
The SOP identifies the Cee® X-Pro II Workstation. Individual module sizes are not specified; a separate instrument performs exposure.
The December 2025 SOP identifies a positive-resist workstation with a spin coater, hotplate and developer, and a negative-resist workstation with a spin coater, two hotplates and developer. The documented substrate range is 1 inch to 150 mm diameter. Coating, bake and develop recipes are loaded through the module interfaces; exposure is performed on a separate exposure tool. The SOP does not identify individual module sizes or substrate materials.
George Mason University Nanofabrication Facility. 2025. Standard Operating Procedure: Photoresist Workstation, Cee X-Pro II. December 2025.
Equipment reference: Page 1, document identification; workstation description and operating sections.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.