Thesis

Block-copolymer coating for nanolithography

Silicon-containing block-copolymer films were prepared for investigations of solvent annealing, film thickness, and nanoscale orientation. The thesis identifies a Cee® 100CB in its instrumentation methods.

How Cee® equipment is used

Film deposition uses a Cee® 100CB. Solvent annealing and film characterization are discussed as separate process stages.

Equipment reported: Cee® 100CB
Source type: Master’s thesis
Publication year: 2012
Materials: Silicon-containing block copolymers
Substrate: Not reported
Source: University of Texas at Austin Thesis

Process context

Logan Joseph Santos’s University of Texas at Austin thesis identifies a Brewer Science CEE100CB in its instrumentation methods. The linked document is an indexed mirror of the May 2012 thesis.

Source and equipment evidence

Santos, Logan Joseph. 2012. Solvent Annealing and Thickness Control for the Orientation of Silicon-containing Block Copolymers for Nanolithographic Applications. Thesis, The University of Texas at Austin. May 2012.

Equipment reference: Instrumentation methods; equipment designation CEE100CB.

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Application summary prepared by Cee. The original source remains the authority for its methods and findings.

Block-copolymer coating for nanolithography

How Cee® equipment is used

Process context

Source and equipment evidence

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