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The Cee® Hood-Mounted Passive Chill Station provides a convenient location for cooling a single substrate after thermal processing on an Apogee® Bake Plate. Mounted on the exterior hood, it keeps the cooling surface close to the bake plate while minimizing the need for additional bench space.
Use suitable thermal PPE and wafer-handling tools to remove the substrate from the bake plate. Close the hood before centering the substrate on the exterior chill station. Remove the substrate before opening the hood again.
Cooling time varies with substrate size, thermal mass, starting temperature, surface contact, ambient airflow, and the required final temperature. Measure temperature when it is critical to the next process step; do not assume a fixed cooldown time.
The station is factory-installed and requires no additional facility utilities. Treat recently loaded substrates and contact surfaces as hot. Confirm the station is securely mounted, clean, and undamaged before use. Once cool, clean with a nonabrasive cloth and an agent compatible with the station surface and process residue.
For Apogee® Bake Plates configured with the hood-mounted chill option. Maximum substrate size is governed by the host plate size and installed station configuration.
<10 seconds
200 mm (8 in) SEMI-spec silicon wafer
200°C to ambient
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.