Characterisation of graphene electrodes for microsystems and microfluidic devices

How Cee® equipment is used

Approximately 3 mL of SU-8 was dispensed onto a 75 × 25 × 1 mm glass slide carrying 50 nm of copper. The coating recipe used 500 rpm for 25 seconds with 100 rpm/s acceleration, followed by 1300 rpm for 30 seconds with 300 rpm/s acceleration, targeting a 30 µm resist layer. Subsequent baking used separately identified Corning and Fisher equipment. Source: Traditional photolithography fabrication procedure.

Equipment reported

Cee® 200X

Source type

Research paper

Publication year

2019

Materials

SU-8

Substrate

Glass

Source

Scientific Reports (Springer Nature)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include SU-8.