Evaporation of water droplets on photoresist surfaces – An experimental study of contact line pinning and evaporation residues

How Cee® equipment is used

Materials methods explicitly identify Brewer Science model Cee200X for JSR deep-UV photoresist on silicon.

Equipment reported

Cee® 200X

Source type

Research paper

Publication year

Not recorded

Materials

Photoresist

Substrate

Si

Source

ScienceDirect

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Photoresist.