Fabrication methods for high reflectance dielectric-metal point contact rear mirror for optoelectronic devices

How Cee® equipment is used

The equipment section explicitly identifies a spin coater and hotplate from Cost Effective Equipment. The process flows include SU-8 spin-on dielectric spacers and photolithographic patterning for reduced-area metal contacts. Individual Cee® model numbers and experimental wafer sizes are not stated in the equipment description. This is a published research collaboration, rather than a claim of a separate installation at every author's institution.

Equipment reported

Cee® equipment; model not reported

Source type

Research paper

Publication year

2022

Materials

Photoresist, SU-8

Substrate

Not reported

Source

MethodsX (Elsevier)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Photoresist, SU-8.