Directing lineage specification of human mesenchymal stem cells by decoupling electrical stimulation and physical patterning on unmodified graphene

How Cee® equipment is used

The graphene-patterning method identifies AZ5214 coating at 4000 rpm for 45 seconds on a Cee® 200CB. Photolithography and oxygen-plasma etching then transferred the pattern to graphene. The equipment attribution applies to the resist-coating step; the separate PDMS substrate-preparation step is not assigned to this coater. Source: Graphene Patterning.

Equipment reported

Cee® 200CB

Source type

Research paper

Publication year

2016

Materials

AZ5214

Substrate

Not reported

Source

Nanoscale (Royal Society of Chemistry)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include AZ5214.