Experimental Observations of Graphene at Phospholipid Monolayers

How Cee® equipment is used

The fabrication method starts with an 8.5 × 8.5 mm graphene-on-copper-foil sample. Its front side was coated with approximately 1.2 µm of AZ1512 photoresist using the named Cee® Brewer Science 200CB Spin Coater before photolithography. The substrate is graphene on copper foil, rather than a silicon wafer. Source: graphene-particle fabrication methods; published in Langmuir in 2026.

Equipment reported

Cee® 200CB

Source type

Research paper

Publication year

2026

Materials

AZ1512

Substrate

Not reported

Source

Langmuir (American Chemical Society)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include AZ1512.