Spin Coater – LSU New Orleans AMRI

How Cee® equipment is used

The AMRI process description identifies the Cee® 200-CB combination system for photoresist application and baking during thin-film patterning.

Equipment reported

Cee 200-CB

Source type

Facility process reference

Publication year

Not recorded

Materials

Photoresist

Substrate

Not reported

Source

LSU New Orleans AMRI

Process context

This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include Photoresist.