Photomask Making – Research Core Facilities

How Cee® equipment is used

The UT Dallas procedure identifies a Cee® spinner and hotplate for photoresist application and prebaking in photomask fabrication. Exact equipment models are not specified.

Equipment reported

Cee spinner and hotplate; model unspecified

Source type

SOP

Publication year

Not recorded

Materials

Photoresist

Substrate

Not reported

Source

University of Texas at Dallas Research Core Facilities

Process context

This procedure describes the source facility’s installation. Its recipes, operating limits, and training requirements apply to that installation; consult the original procedure before use. Materials recorded for this reference include Photoresist.