CEE 100CB Bench Mounted Spinner/Hotplate – Claire & John Bertucci Nanotechnology Laboratory – College of Engineering – Carnegie Mellon University

How Cee® equipment is used

The facility describes the Cee® 100CB combination spinner/hotplate for positive-photoresist application and vacuum baking. This is a process-capability reference.

Equipment reported

Cee 100CB

Source type

Facility process reference

Publication year

Not recorded

Materials

Photoresist

Substrate

Not reported

Source

Carnegie Mellon Bertucci Nanotechnology Laboratory

Process context

This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include Photoresist.