Spin coat: UV resist station [BREWER-UVspinbake] | Quantum-Nano Fabrication and Characterization Facility | University of Waterloo

How Cee® equipment is used

Waterloo's UV-resist station pairs a Cee® 200X spin coater with a Cee® 1300X bake plate. This station is documented separately from the electron-beam-resist station.

Equipment reported

Cee 200X; Cee 1300X

Source type

Facility process reference

Publication year

Not recorded

Materials

Photoresist

Substrate

Not reported

Source

University of Waterloo QNFCF

Process context

This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include Photoresist.