Facility / company reference
CNSE Innovation Lab | University at AlbanyApogee spin-coater/bake system
The patent reports photoresist prebaking for minimally invasive electrocorticographic interfaces.
The patent's fabrication description identifies an Apogee® bake plate for photoresist prebaking. The application is an electrocorticographic brain-computer interface; an exact bake-plate size is not inferred.
This entry describes a patent example. Consult the original document for the experimental procedure and the scope of its claims. Materials recorded for this reference include Photoresist.
Justia Patents. Minimal invasive electrocorticographic brain-computer interface.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.