Thesis
Optimization of 0.3 µm Photolithography Process Steps on PolysiliconCee® 200X and Cee® 200XD
This source documents MEMS coating and development at Naval Postgraduate School.
The Naval Postgraduate School describes a Cee® 200X coater and an Apogee® spin developer in its MEMS cleanroom. The recorded source does not establish the developer's model size.
This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include Photoresist.
Naval Postgraduate School Center for Materials Research. Cleanroom – Center for Materials Research – Naval Postgraduate School.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.