Thesis

Development of an Adaptive X-ray Research Facility and a Direct Bonded Silicon Reference Object for Computed Tomography

The study reports resist coating and bake processing for a bonded-silicon CT reference object.

How Cee® equipment is used

Jeffery Thousand's doctoral research identifies a Cee® 200 and Cee® 1100FX for resist coating and bake processing. These steps support fabrication of a directly bonded silicon reference object for computed tomography; the source does not attribute the bonding step to a Cee® bonder.

Equipment reported
Cee 200; Cee 1100FX
Source type
Thesis
Publication year
2020
Materials
Photoresist
Substrate
Si
Source
UNC Charlotte Doctoral Thesis

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Photoresist.

Source and equipment evidence

UNC Charlotte Doctoral Thesis. 2020. Development of an Adaptive X-ray Research Facility and a Direct Bonded Silicon Reference Object for Computed Tomography.

Open original source ↗

Application summary prepared by Cee. The original source remains the authority for its methods and findings.

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Spin coating, bake and chill, temporary bonding and debonding.

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