Thesis
Development of an Adaptive X-ray Research Facility and a Direct Bonded Silicon Reference Object for Computed TomographyCee 200; Cee 1100FX
The study reports photoresist patterning of chip-based redox-cycling microelectrode arrays.
A Cee® 200CBX is identified in photoresist patterning of chip-based microelectrode arrays. The arrays support generation-collection detection by snapshot redox-cycling voltammetry.
The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Photoresist.
PubMed Central. Snapshot Redox Cycling Voltammetry (Snapshot RCV): Fast Generation-Collection Detection across a Wide Potential Range at a Chip-Based Microelectrode Array.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.