A Silicon p-i-n Detector for a Hybrid CMOS Imaging System

How Cee® equipment is used

The fabrication traveler names a Cee® 100 resist spinner for Microprime P20 and HPR 504 processing, and a Cee® 100 developer for development steps. The silicon detector arrays are subsequently hybridized with CMOS readout circuitry. The Cee® attribution concerns lithography.

Equipment reported

Cee® 100 Resist Spinner and Cee® 100 Developer

Source type

Thesis

Publication year

2012

Materials

Photoresist

Substrate

Si

Source

RIT ScholarWorks

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Photoresist.