SOP / protocol

PMGI SF 6 lift-off process – LNF

This process document describes PMGI lift-off underlayer coating and subsequent photoresist development. The workflow uses Apogee® Spin Coater; Cee® developer.

How Cee® equipment is used

Recipe gives Apogee spin conditions for350nm PMGI and CEE puddle-development steps.

Equipment reported: Apogee® Spin Coater; Cee® developer
Source type: Process recipe
Publication year: Not recorded
Materials: Developer, Photoresist
Substrate: Not reported
Source: LNF Wiki, University of Michigan Lurie Nanofabrication Facility

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Developer, Photoresist.

Source and equipment evidence

LNF Wiki, University of Michigan Lurie Nanofabrication Facility. PMGI SF 6 lift-off process – LNF.

Open original source ↗

Application summary prepared by Cee. The original source remains the authority for its methods and findings.

PMGI SF 6 lift-off process – LNF

How Cee® equipment is used

Process context

Source and equipment evidence

Related applications

Bring your process questions.