SOP / protocol
Integrated photoresist processing in X-Pro II WorkstationsX-Pro II Workstation
Thin photoresist films supported fabrication of structures used to redistribute the focusing intensity of surface plasmon polaritons.
The source identifies a Cee® 200X for coating FPT-8Boc at 3000 rpm and a Cee® 1300X for drying. It reports a resulting resist film thickness of 30 nm. These values describe the authors’ process.
The experimental section names Cee 200X coating of FPT-8Boc and Cee 1300X drying during thin-resist preparation.
Ji J, Xu P, Lin Z, Chen J, Li J, Meng Y. 2020. Application of the Metal Reflector for Redistributing the Focusing Intensity of SPPs. Nanomaterials (Basel, Switzerland). 10(5):E937. DOI: 10.3390/nano10050937.
Equipment reference: Experimental fabrication description, FPT-8Boc film preparation.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
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