SOP / protocol

SU-8 lithography – LNF

This process document describes SU8 films for PDMS molds and MEMS structures. The workflow uses Apogee® Spin Coater (ROBIN).

How Cee® equipment is used

The page provides SU8 spin curves derived on the Apogee Spinner ROBIN and processing recommendations.

Equipment reported
Apogee® Spin Coater (ROBIN)
Source type
Process recipe
Publication year
Not recorded
Materials
SU-8
Substrate
Not reported
Source
LNF Wiki, University of Michigan Lurie Nanofabrication Facility

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include SU-8.

Source and equipment evidence

LNF Wiki, University of Michigan Lurie Nanofabrication Facility. SU-8 lithography – LNF.

Open original source ↗

Application summary prepared by Cee. The original source remains the authority for its methods and findings.

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