Deposition of permanent polymer structures for OLED fabrication

How Cee® equipment is used

Example2 coats MicroChem XP LOR10B and TOK photoresist using CEE spinner equipment.

Equipment reported

Cee® 100CB

Source type

Patent experimental example

Publication year

Not recorded

Materials

LOR10B, Photoresist

Substrate

Not reported

Source

Justia Patents

Process context

This entry describes a patent example. Consult the original document for the experimental procedure and the scope of its claims. Materials recorded for this reference include LOR10B, Photoresist.