Ambipolar Ballistic Electron Emission Microscopy Studies of Gate-field Modified Schottky Barriers

How Cee® equipment is used

Fabrication methods identify Cost Effective Equipment100CB for photoresist coating and bake. Cover/metadata verify Yulu Che,Ohio State,2010.

Equipment reported

Cee® 100CB

Source type

Doctoral dissertation

Publication year

2010

Materials

Photoresist

Substrate

Not reported

Source

OhioLINK Theses

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Photoresist.