Capabilities – University of Delaware Nanofabrication Facility

How Cee® equipment is used

The facility describes a Cee® 200CBX for resist coating and baking, including electron-beam resists, photoresists and SU-8. This is a documented facility workflow rather than an individual research experiment.

Equipment reported

Cee 200CBX

Source type

Facility process reference

Publication year

Not recorded

Materials

SU-8

Substrate

Not reported

Source

University of Delaware Nanofabrication Facility

Process context

This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include SU-8.