Facility / company reference

CEE Resist Developer – Semiconductor Nanofabrication Laboratory – Confluence

This source documents CD-26 photoresist development at RIT; archived instructions.

How Cee® equipment is used

RIT's archived procedure identifies a Cee® resist developer using CD-26 chemistry. The source provides historical operating instructions; it does not establish the current facility configuration.

Equipment reported
Cee developer; model unspecified
Source type
Facility process reference
Publication year
Not recorded
Materials
CD-26 developer
Substrate
Not reported
Source
RIT Semiconductor Nanofabrication Laboratory

Process context

This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include CD-26 developer.

Source and equipment evidence

RIT Semiconductor Nanofabrication Laboratory. CEE Resist Developer – Semiconductor Nanofabrication Laboratory – Confluence.

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Application summary prepared by Cee. The original source remains the authority for its methods and findings.

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