Facility / company reference
Cleanroom – Center for Materials Research – Naval Postgraduate SchoolCee 200X; Apogee spin developer
This source documents CD-26 photoresist development at RIT; archived instructions.
RIT's archived procedure identifies a Cee® resist developer using CD-26 chemistry. The source provides historical operating instructions; it does not establish the current facility configuration.
This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include CD-26 developer.
RIT Semiconductor Nanofabrication Laboratory. CEE Resist Developer – Semiconductor Nanofabrication Laboratory – Confluence.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.