Paper / report
Evaporation of water droplets on photoresist surfaces – An experimental study of contact line pinning and evaporation residuesCee® 200X
A Cee® 200X Spin Coater applied SU-8 during the conventional photolithography process used alongside graphene-electrode fabrication methods. The coated substrates were copper-coated glass slides for microsystem and microfluidic electrode development.
Approximately 3 mL of SU-8 was dispensed onto a 75 × 25 × 1 mm glass slide carrying 50 nm of copper. The coating recipe used 500 rpm for 25 seconds with 100 rpm/s acceleration, followed by 1300 rpm for 30 seconds with 300 rpm/s acceleration, targeting a 30 µm resist layer. Subsequent baking used separately identified Corning and Fisher equipment. Source: Traditional photolithography fabrication procedure.
The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include SU-8.
Scientific Reports (Springer Nature). 2019. Characterisation of graphene electrodes for microsystems and microfluidic devices.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.