NRF Lithography Processes SOP – University of Florida

How Cee® equipment is used

The NRF lithography procedure identifies a Cee® hotplate in resist-bake steps. The recorded attribution does not specify the hotplate model.

Equipment reported

Cee hotplate; model unspecified

Source type

SOP

Publication year

Not recorded

Materials

Photoresist

Substrate

Not reported

Source

University of Florida Nanoscale Research Facility

Process context

This procedure describes the source facility’s installation. Its recipes, operating limits, and training requirements apply to that installation; consult the original procedure before use. Materials recorded for this reference include Photoresist.