Direct drying gas toward the wafer center to help clear remaining liquid after developing or rinsing. Recipe-controlled timing and adjustable flow let the blow-off step work with the spin sequence.
Requires a dispense control box, sold separately. One box supports up to four dispenses. Need more than four? Add dispense control boxes to expand your system.
Choose the fixed developer installation or the AccuScan™ arm installation.
N₂ blow-off directs a focused gas jet toward the spinning wafer to assist drying from the center outward. It helps move residual process liquid away from the center as part of the final drying sequence.
Adjust the gas flow and coordinate the start time and duration with DataStream™ recipe steps. Match the drying sequence to substrate size, remaining liquid, and spin conditions.
Choose the standard developer installation or the version mounted on an AccuScan™ developer arm. Both configurations use the dispense control box for automated gas delivery.
Select N-1-L for standard N₂ blow-off on an Apogee® developer, or N-1-AS for N₂ blow-off on the AccuScan™ developer arm. These are the two available configurations.
Confirm the developer model, substrate size, and wet-process sequence. Set gas flow, start time, duration, and spin conditions to suit the remaining liquid and drying requirements. The AccuScan™ configuration requires a compatible arm; the arm and dispense control box are specified separately.
The assembly connects to the dispense control box.
Purchased separately: The dispense control box and, for N-1-AS, the AccuScan™ developer arm.
Center-focused gas drying
Adjustable
N-1-L or N-1-AS
Supplied by the dispense control box
DataStream™ recipe
Standard Apogee® developer or AccuScan™ developer arm
Need heated dispensing, a special delivery method, or a configuration you don’t see here? Cee® offers custom solutions built around your material, equipment, and process.
See examples of our custom equipment, then contact Cee® to discuss your dispense requirements.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.
