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X-Pro II Workstation ORDER NOW Full size workstation for use with up to two 200mm modules or one 300mm module Compare Models Manuals & Documents
Reveal the Pattern Complete spin spray developing the first time, every time. Apogee® Spin Developer For substrates up to 200mm round or 6″ x 6″
AccuScan™ Dispense The Cee® AccuScan™ Dispense is designed for use with the Apogee® Spin Developer, to provide precise and uniform dispensing for semiconductor substrates. This
AccuScan™ Dispense The Cee® AccuScan™ Dispense is designed for use with the Apogee® Spin Coater, to provide precise and uniform dispensing for semiconductor substrates. This
Amplifying Adhesion: HMDS Bake Our client faced persistent issues with photoresist delamination during the photolithography process. To address this, we implemented a solution involving Hexamethyldisilazane
UV Cure Spin Coater A leading nanophotonics and nano-optic security company partnered with Cee® to develop a custom UV cure spin coater. The tool integrates
Large Format Spin Coater In the realm of genetic engineering, diagnostic nanomaterials, and high-precision diagnostic equipment, precision and uniformity are paramount. When a leading company
Edge Bead Removal Edge Bead Removal (EBR) removes excess material from the edge of a coated substrate. A solvent is applied to the outside perimeter of the spinning
N2 Blow-Off Accelerate drying and increase throughput with N2 blow-off. Centrifugal force is not always efficient at fully drying substrates. An automated air jet nozzle
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