Dispenses / Spin Developer Dispenses
Choose fixed or scanning fan-spray delivery, backside rinsing, and drying steps for your Apogee® developer.
For automated pneumatic dispensing, the control box converts your spin coater or developer’s electrical commands into valve triggers and regulated reservoir pressure. One four-position box supports up to four dispenses. Need more than four dispenses? Add four-position dispense control boxes to expand your system.
Fixed fan-spray delivery for developing and cleaning processes.
Precisely position and scan the fan spray for demanding processes such as metal liftoff, precision cleaning, and high aspect ratio applications.
A directed gas jet helps dry the wafer after wet processing.
An upward liquid stream removes process material from the substrate backside.
Cee® offers customized dispense solutions for applications that need a different approach. Explore examples of our custom equipment, then contact Cee® to discuss your process requirements.
Tell us your Cee tool, substrate size, material chemistry, viscosity, and desired dispense sequence. We can help match the delivery method and fluid path to your application.
