Paper / report
Molecular-glass resist coating for advanced lithographyCee® 200X
Pyrene-derived molecular-glass formulations were evaluated as electron-beam resists. A Cee® 200X deposited the resist films on primed silicon before bake, exposure, and development.
The source names a CEE200X coating machine for spin coating. The associated bake steps are described separately; the paper does not identify their hotplate manufacturer.
The filtered resist solution was spin coated on primed silicon. The reported prebake was 80 °C for 180 seconds, followed by electron-beam exposure and a post-exposure bake. These are study conditions, rather than general equipment settings.
Cong X, Zhang S, Gao J, Cui X, Wu Y, Guo X, Hu R, Wang S, Chen J, Li Y, Yang G. 2024. Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography. ACS omega. 9(36):37585-37595. DOI: 10.1021/acsomega.4c01044.
Equipment reference: Experimental Section, photoresist film preparation.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
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