Paper / report
Pyrene-based resist coating for electron-beam lithographyCee® 200X
Tetraphenylsilane-derived molecular-glass resists were evaluated for electron-beam and extreme-ultraviolet lithography. A Cee® 200X prepared the resist films.
The equipment appears in the film-preparation instrumentation description. Exposure, metrology, and other process instruments are separately identified in the paper.
The experimental section identifies a CEE200X coating machine for preparing tetraphenylsilane-derived resist films.
Wang Y, Chen J, Zeng Y, Yu T, Guo X, Wang S, Allenet T, Vockenhuber M, Ekinci Y, Zhao J, Yang S, Wu Y, Yang G, Li Y. 2022. Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography. ACS omega. 7(33):29266-29273. DOI: 10.1021/acsomega.2c03445.
Equipment reference: Experimental Section, Materials and Instruments.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
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