Patent
Surface treatments for alignment of block copolymersCee® 100CB
This patent describes silicon hardmask/neutral layers for directed self-assembly. The workflow uses Cee® 100CB.
Example solvent/developer exposure tests use a Cee100CB spin-coater/bake-plate tool.
This entry describes a patent example. Consult the original document for the experimental procedure and the scope of its claims. Materials recorded for this reference include Photoresist.
Google Patents. Method for directed self-assembly.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.