Paper / report

Thermal-slide release of TSV wafers with copper pillars

NCAP and Chinese Academy of Sciences researchers investigated temporary support and release for TSV wafers with copper-pillar topography.

How Cee® equipment is used

A Cee® 1300DB performs thermal-slide release. Bonding is assigned to a separate EVG 520 in the reported process; the Cee® instrument is not described as the bonder.

Equipment reported
Cee® 1300DB
Source type
Conference research paper
Publication year
2014
Materials
Temporary Bonding Adhesive
Substrate
Si
Source
NCAP and Chinese Academy of Sciences, ICEPT

Process context

The NCAP/CAS conference study reports thermal-slide release on a Cee® 1300DB at 190°C after processing 8-inch silicon wafers. Bonding uses a separate EVG 520. The authors have NCAP/CAS affiliations; Brewer WaferBOND chemistry remains part of the reported process.

Source and equipment evidence

Jing X, Jiang F, Xu C, Xue K, Dai F, Li Z, Zhang W. 2014. Investigation of temporary bonding and release processes for TSV with copper pillar bumps. 15th International Conference on Electronic Packaging Technology. pp. 86–89. DOI: 10.1109/ICEPT.2014.6922602.

Equipment reference: Thermal-slide debonding experiment, Cee 1300DB equipment mention.

Open original source ↗

Application summary prepared by Cee. The original source remains the authority for its methods and findings.

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