Lithographic performances of aryl sulfonate ester-modified polystyrenes as nonchemically amplified resists

How Cee® equipment is used

The experimental methods explicitly identify CEE200X and an Apogee Bake Plate for resist-film preparation before electron-beam and EUV evaluation.

Equipment reported

Cee® 200X; Apogee® Bake Plate

Source type

Research paper

Publication year

Not recorded

Materials

Photoresist, Polystyrene

Substrate

Not reported

Source

Royal Society of Chemistry

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Photoresist, Polystyrene.