Patent

Method for directed self-assembly

This patent describes silicon hardmask/neutral layers for directed self-assembly. The workflow uses Cee® 100CB.

How Cee® equipment is used

Example solvent/developer exposure tests use a Cee100CB spin-coater/bake-plate tool.

Equipment reported
Cee® 100CB
Source type
Patent experimental example
Publication year
Not recorded
Materials
Photoresist
Substrate
Not reported
Source
Google Patents

Process context

This entry describes a patent example. Consult the original document for the experimental procedure and the scope of its claims. Materials recorded for this reference include Photoresist.

Source and equipment evidence

Google Patents. Method for directed self-assembly.

Open original source ↗

Application summary prepared by Cee. The original source remains the authority for its methods and findings.

SEMICON EUROPA · 10–13 NOVEMBER

Bring your process questions.

Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.

Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.

Book a stand meeting →

Mention Jacob from CEE in SiSTEM’s booking form.