SOP / protocol
Spray and puddle development with integrated resist bakingCee® 200CBX
This process document describes silicon-window/art-wafer photolithography training process. The workflow uses Apogee® Bake Plate.
Sample project traveler specifies Apogee Bake Plate for dehydration and HMDS primer bake; the coating tool is separately identified as Laurell.
The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include HMDS.
California DREAMS. 2025. California DREAMS Cleanroom Gateway Handbook.
Open original source ↗Application summary prepared by Cee. The original source remains the authority for its methods and findings.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.