Permanent resist composition, cured product thereof, and use thereof

How Cee® equipment is used

Samples are coated on100mm silicon using CEE100CB and baked on its attached hotplates before exposure.

Equipment reported

Cee® 100CB

Source type

Patent experimental example

Publication year

Not recorded

Materials

Photoresist

Substrate

Si

Source

Google Patents

Process context

This entry describes a patent example. Consult the original document for the experimental procedure and the scope of its claims. Materials recorded for this reference include Photoresist.