Patent

Apparatus and method for recirculating alkane impregnation solution

This patent describes photoresist preparation, post-exposure bake and topcoat removal for immersion-fluid testing. The workflow uses Cee® 100CB.

How Cee® equipment is used

Wafer-preparation experiment identifies CEE100CB spinner/hotplate and subsequent spin-cleaning of the topcoat.

Equipment reported: Cee® 100CB
Source type: Patent experimental example
Publication year: Not recorded
Materials: Photoresist
Substrate: Not reported
Source: Google Patents

Process context

This entry describes a patent example. Consult the original document for the experimental procedure and the scope of its claims. Materials recorded for this reference include Photoresist.

Source and equipment evidence

Google Patents. Apparatus and method for recirculating alkane impregnation solution.

Open original source ↗

Application summary prepared by Cee. The original source remains the authority for its methods and findings.

Apparatus and method for recirculating alkane impregnation solution

How Cee® equipment is used

Process context

Source and equipment evidence

Related applications

Bring your process questions.