Don’t risk your lithography results with outdated bath immersions and stopwatches. Get unmatched precision, consistent chemistry, flawless pattern development, and a clean dry wafer—every time with the Apogee® Spin Developer.
Whether it’s photomasks or wafers, cleaning, developing, or metal lift-off, you’re covered. With direct spray, stream dispense, or optional high-impingement spray, you can count on consistent results.
Unlock your new standard of excellence and experience what manual processes can’t achieve. Step-by-step programmability and adjustable dispense configurations provide unparalleled repeatability, enhance aspect ratios, and reduce waste.
For almost 40 years, professionals around the globe have trusted Cee® systems to provide dependable, long-lasting performance they can count on. Whether in cutting-edge R&D labs or high-demand production environments, Cee® Spin Developers are constructed with top-quality materials and subjected to rigorous durability testing.
| Model(Mounting style) |  Apogee® 200 Spin Developer(Benchtop) |  Apogee® 200 Spin Developer(Flange-Mount) |  Apogee® 200 Spin Developer(X-Pro) |  Apogee® 450 Spin Developer(Benchtop) |  Apogee® 450 Spin Developer(Flange-Mount) |  Apogee® 450 Spin Developer(X-Pro) |
|---|---|---|---|---|---|---|
| SKU | A-B-SD2-1 (110 V) A-B-SD2-2 (220 V) | A-FP-SD2-1 (110 V) A-FP-SD2-2 (220 V) | A-X-SD2-2 | A-B-SD3 | A-F-SD3 | A-X-SD3-2 |
| Min substrate size | 1/8" (4mm) | 1/8" (4mm) | 1/8" (4mm) | 1/8" (4mm) | 1/8" (4mm) | 1/8" (4mm) |
| Max substrate size | 200mm Round
or
6"x 6" square | 200mm Round
or
6"x 6" square | 200mm Round
or
6"x 6" square | 450mm Round
or
14"x 14" square | 450mm Round
or
14"x 14" square | 450mm Round
or
14"x 14" square |
| Max spin speed | 12,000 rpm | 12,000 rpm | 12,000 rpm | 6,000 rpm | 6,000 rpm | 6,000 rpm |
| Dimensions | W: 13.25” (337mm) D: 21” (533mm) H: 20” (508mm) | W: 14” (356mm) D: 17” (432mm) H: 8.25” (210mm) | See X-Pro II Workstation | W: 27.625” (702mm) D: 30.75” (781mm) H: 23.5” (597mm) | W: 30” (762mm) D: 30” (762mm) H: 10” (254mm) | See X-Pro II Workstation |
| 7″ touchscreen with DataStream™ control system and remote management | Included | Included | Included | Included | Included | Included |
| Input voltage | 100-120V or 208-230V | 100-120V or 208-230V | 208-230V | 208-230V | 208-230V | 208-230V |
Select any model column to view its equipment page.
Scroll sideways to compare all six models.
Engineered for superior performance, usability, versatility—and peace of mind.
On-board 7-inch color touchscreen with DataStream™ OS included for visibility and your ease-of-use.
Integrated splash ring prevents droplets from redepositing onto the wafer for a contamination-free surface and defect-free results.
A brushless motor and indirect drive with oversized bearings/belt provide unmatched uptime, thermal isolation, and performance.
The built-in spindle fluid deflector keeps liquids out of your drive train and bearings, without purge gases.
Integrated PFA fluid trap protects your vacuum components and pumps from unwanted contamination and blockage.
Sophisticated fluid separator evacuates chemical fumes while safely guiding fluid waste to the drain.
Elevate your process with advanced controls, a multitude of sensors, and recipe-driven dispenses. Effortlessly fine-tune every detail using our intuitive, user-friendly interface. Achieve exceptional results with ease.
Knowledge is power. With DataStream™ technology, monitor and manage in real time, ensuring production-quality results from anywhere. Proactive warnings and detailed log files give you the information you need to succeed.
Process parameters and measurements are logged in real-time. Export in multiple formats for analysis, troubleshooting, and process optimization.
Access your Apogee® Spin Developer remotely via any web browser for real-time monitoring, adjustments, and recipe management. Create, modify, upload, download, and archive recipes seamlessly.
NRTL certification is crucial for semiconductor equipment, ensuring compliance with safety standards set by regulatory bodies like OSHA and ANSI.
Cee® spin developers are NRTL listed right out of the box…
…your safety department is going to love you.
When advanced processes require advanced features, Cee® has you covered. Personalize your spin coater right from the factory.
Discover a whole new level of control with AccuScan™ Dispense; a programmable scanning arm offering precision dispense and edge bead removal.
Got incompatible materials? Divert, isolate, and route waste through multiple paths. Switch mid-process with recipe-controlled functionality.
Challenge accepted! Any size, shape, material, or design, Cee® tailored spin chucks are expertly matched to your substrates.
With four decades of experience, our experts will collaborate closely with you to understand your requirements and deliver solutions that exceed expectations.
SEMICON EUROPA · 10–13 NOVEMBER
Meet Jacob, CEE’s Global Sales Director, in Munich with our partner SiSTEM Technology.
Stand C1353 · Messe München
Spin coating, bake and chill, temporary bonding and debonding.
Mention Jacob from CEE in SiSTEM’s booking form.
