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SOP / protocolCee® 200CBX2015
MIT Fabtools
This process document describes spray and puddle development plus post-exposure, image-reversal and hard bakes. The workflow uses Cee® 200CBX.
LithographyCD-26 developerDeveloperDI Water
Citation & equipment evidence
Source reference
Payer K. 2015. develop-Brewer Hotplate and Develop Station Standard Operating Procedure. Massachusetts Institute of Technology. October 2015.
Equipment evidence
The source names the installation Cee 200CBX and describes a developer and hotplate workflow. Its documented process role is retained rather than inferring a coater configuration from the model name.
Source location: Page 1, Model, Purpose, Author, and Introduction.
Paper / reportCee® 200X; Cee® 1300X2020
PubMed Central
This study describes photoresist preparation for surface-plasmon-polariton focusing structures. The workflow uses Cee® 200X; Cee® 1300X.
PhotonicsPhotoresist
Citation & equipment evidence
Source reference
Ji J, Xu P, Lin Z, Chen J, Li J, Meng Y. 2020. Application of the Metal Reflector for Redistributing the Focusing Intensity of SPPs. Nanomaterials (Basel, Switzerland). 10(5):E937. DOI: 10.3390/nano10050937.
Equipment evidence
The source identifies a Cee® 200X for coating FPT-8Boc at 3000 rpm and a Cee® 1300X for drying. It reports a resulting resist film thickness of 30 nm. These values describe the authors’ process.
Source location: Experimental fabrication description, FPT-8Boc film preparation.
Paper / reportCee® 200X; Apogee® Bake Plate
Royal Society of Chemistry
This study describes nonchemically amplified polystyrene resists for advanced lithography. The workflow uses Cee® 200X; Apogee® Bake Plate.
LithographyPhotoresistPolystyrene
Citation & equipment evidence
Source reference
Royal Society of Chemistry. Lithographic performances of aryl sulfonate ester-modified polystyrenes as nonchemically amplified resists
Equipment evidence
The experimental methods explicitly identify CEE200X and an Apogee Bake Plate for resist-film preparation before electron-beam and EUV evaluation.
ThesisCee® 100CB
TU Ilmenau Thesis
This thesis describes silicon cantilever microfabrication for integrated SPM/SEM. The workflow uses Cee® 100CB.
MicrofabricationPhotoresist
Citation & equipment evidence
Source reference
TU Ilmenau Thesis. Fabrication and characterization of self-sensing and self-actuating piezoresistive microscale silicon cantilevers for an integrated scanning probe microscopy and scanning electron microscopy system
Equipment evidence
Methods identify the Cee 100CB hotplate and describe TI Prime/AZ1518 lithography.
PatentCee spinners and hotplates; models unspecified
Google Patents
This patent describes spin-on gap-fill materials for deep wafer topography. The workflow uses Cee spinners and hotplates; models unspecified.
Advanced PackagingMaterial Science
Citation & equipment evidence
Source reference
Google Patents. Solubility switch topographic fill materials and methods
Equipment evidence
The patent's experimental text identifies spinners and hotplates from Cost Effective Equipment in the fill-material preparation workflow.
PatentCee® 100CB
Google Patents
This patent describes cross-linked surface treatments controlling block-copolymer orientation. The workflow uses Cee® 100CB.
LithographyNanofabrication
Citation & equipment evidence
Source reference
Google Patents. Surface treatments for alignment of block copolymers
Equipment evidence
Instrumentation section explicitly states films were coated and baked on a Brewer CEE100CB.
ThesisCee® 200; Cee® 1100FX2025
UNC Charlotte Doctoral Thesis
This thesis describes lateral devices for organic–inorganic hybrid semiconductor transport measurements. The workflow uses Cee® 200; Cee® 1100FX.
Material ScienceSU-8
Citation & equipment evidence
Source reference
UNC Charlotte Doctoral Thesis. 2025. Transport Properties of II-VI Organic-Inorganic Hybrid Semiconductors
Equipment evidence
Dissertation methods identify a CEE200 for SU8 coating and CEE1100FX for two-step prebake.
Paper / reportCee® spin coater and integrated hotplate
Micromachines (MDPI)
This study describes patterned titanium electrodes for parasite enrichment. The workflow uses Cee® spin coater and integrated hotplate.
BioMicrofluidicsPhotoresist
Citation & equipment evidence
Source reference
Micromachines (MDPI). Highly Localized Enrichment of Trypanosoma brucei Parasites Using Dielectrophoresis
Equipment evidence
Titanium-electrode fabrication explicitly uses Brewer Sciences Cee spin coater and integrated hotplate for LOR.
PatentCee® 100CB
Google Patents
This patent describes silicon hardmask/neutral layers for directed self-assembly. The workflow uses Cee® 100CB.
LithographyNanofabricationPhotoresist
Citation & equipment evidence
Source reference
Google Patents. Method for directed self-assembly
Equipment evidence
Example solvent/developer exposure tests use a Cee100CB spin-coater/bake-plate tool.
PatentCee® 100; Cee® 1100
Google Patents
This patent describes low-surface-energy coatings on metal-coated silicon. The workflow uses Cee® 100; Cee® 1100.
Material Science
Citation & equipment evidence
Source reference
Google Patents. Perfluoropolyether benzotriazole derivatives and use thereof as coatings
Equipment evidence
Experimental method uses CEE100 spinner and CEE1100 vacuum hotplate before contact-angle characterization.
PatentCee® 100CB
Google Patents
This patent describes photoresist preparation, post-exposure bake and topcoat removal for immersion-fluid testing. The workflow uses Cee® 100CB.
LithographyPhotoresist
Citation & equipment evidence
Source reference
Google Patents. Apparatus and method for recirculating alkane impregnation solution
Equipment evidence
Wafer-preparation experiment identifies CEE100CB spinner/hotplate and subsequent spin-cleaning of the topcoat.
PatentCee® 100CB
Google Patents
This patent describes thick permanent-resist coating and lithographic evaluation. The workflow uses Cee® 100CB.
LithographyPhotoresist
Citation & equipment evidence
Source reference
Google Patents. Permanent resist composition, cured product thereof, and use thereof
Equipment evidence
Samples are coated on100mm silicon using CEE100CB and baked on its attached hotplates before exposure.
